Phosphoric Acid Nitride Removal - microtechprocess.com
2007-6-8 · Phosphoric Acid Nitride Removal Introduction During the semiconductor manufacturing flow silicon nitride (Si 3N 4) is used for the definition of the active area. Si 3N 4 often denominated as pad nitride is deposited on a SiO 2 layer (“pad oxide”) and partiall y removed by
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